Abstract
The rate constant for the surface diffusion velocity of Cu adions in the deposition of Cu appears to depend on the current density of measurement. An interpretation is suggested in which it is proposed that the number of growth sites during the deposition of Cu under "monolayer" conditions depends upon potential, owing to the dependence of the critical radius for growth upon supersaturation. Calculations based upon this hypothesis are compared with experiment. The dependence of the shape of the Tafel relation in metal deposition (transient conditions) is related to the effect of changing the number of "active" growth sites.
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