Abstract
A method for fabrication of calcium phosphate films on crystalline silicon substrates which employs a high energy dc spark on silicon surfaces in the presence of Ca 1 0 (PO 4 ) 6 (OH) 2 is described. Such a process kinetically traps the desired calcium phosphate on the substrate with concomitant formation of a porous layer. Scanning electron micrographs of the silicon substrate show a nanoporous surface morphology for those areas exposed to spark processing. Energy dispersive X-ray analysis and infrared vibrational spectroscopy of the spark-processed regions of the Si substrate are clearly consistent with the presence of the desired biologically relevant material. In conjunction with an automated stage, facile formation of deliberate micrometer-size patterns is demonstrated.
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