Abstract
Antireflection layers are an important part of the sensitive elements of high performance single photon detectors. We have obtained amorphous silicon dioxide films by electron-beam sputtering on Al2O3, AlN, Si substrates as well as CeB6, LaB6, and W coatings. The elemental composition, microstructure and surface roughness, as well as optical characteristics of the samples obtained under various conditions of spraying are investigated. It is shown that SiO2/Al2O3 and SiO2/AlN two-layer coatings can provide high detection efficiency under registration of the radiation in the near IR region, which is used in telecommunication systems and devices for quantum information processing.
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