Abstract
AbstractFor the first time an operating heterojunction bipolar silicon transistor has been realized with phosphorous doped amorphous silicon (a-Si) emitter. The deposition of a-Si is a relatively simple technique. The current gain (β) of 14 at a base Gummel Number (G.N.) of 1.35 1013 s/cm4 is higher than that obtained with normal diffused emitter bipolar transistors with the same G.N. for the base. This adds a degree of freedom to the design of bipolar structures according to the compromise between base resistance and current gainCrucial points that have to be looked at further are interface recombination at the a-Si/c-Si transition and emitter resistance.
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