Abstract
Experimental studies of the time evolution of a pulsed-DC plasma for deposition of TiN were carried out. By use of optical emission spectroscopy and current measurements, delays in the plasma formation relative to the rise of the voltage were observed. A delay is observed only in cases where TiCl 4, which like Cl is electronegative, is present in the discharge gas. Furthermore, the delay depends on the electrode geometry and T pause, the time interval in which the voltage is set to zero.
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