Abstract

The current-time characteristic during high power pulsed magnetron sputtering is measured under identical conditions for seventeen different target materials. Based on physical processes such as gas rarefaction, ion-induced electron emission, and electron impact ionization, two test parameters were derived that significantly correlate with specific features of the current-time characteristic: i) the peak current is correlated to the momentum transfer between the sputtered material and the argon gas, ii) while the observed current plateau after the peak is connected to the metal ionization rate.

Highlights

  • From a curiosity within the coating technology [1], high power pulsed magnetron sputtering (HPPMS) has rapidly become a well-established deposition technique with a broad application field

  • To illustrate the impact of the steepness on the overall waveform measured during HPPMS, magnesium targets were sputter eroded

  • The increased magnetic field strength generally results in an increase of the steepness [28]. This behavior was shown for HPPMS by Capek et al by increasing the target-to-magnet distance with paramagnetic Cu spacers [29, 30]

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Summary

Introduction

From a curiosity within the coating technology [1], high power pulsed magnetron sputtering (HPPMS) has rapidly become a well-established deposition technique with a broad application field. An overall understanding of the discharge current behavior has been reached Processes such as gas rarefaction, self-sputtering, electron emission by single and multi-charged species, and electron impact ionization come into play to define the current waveform. Only a limited number of papers has studied the impact of the target material on the current waveform [22]. A literature search reveals that only a limited number of materials are studied. Rather arbitrarily we define “a well-studied material” as a material with 10% of the number of papers of the most studied material, i.e. titanium From this definition only six elements (Ti, Al, Cr, Si, Cu, and Nb) can be given this label. In this paper we have studied the current waveform for 17 different target materials under identical conditions. The selection has been made based on metals studied to some extend in literature [Ti, Al, Cr, Cu, Nb, Zn, V, Ag, Ta, Zr, and Y, with exception of Si (semiconductor), and Fe (magnetic)] together with some less studied

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