Abstract

The effect of etching solution on the synthesis process of two-dimensional vanadium carbide (V2C MXene) was researched. Three etching solutions were used to etch ternary carbide V2AlC at 90 °C. The three solutions were: lithium fluoride + hydrochloric acid (LiF + HCl), sodium fluoride + hydrochloric acid (LiF + HCl), and potassium fluoride + hydrochloric acid (KF + HCl). It was found that only NaF + HCl solution was effective for synthesizing highly pure V2C MXene. The existence of sodium (Na+) and chloridion (Cl−) in etching solution was essential for the synthesis. The thermal stability of the as-prepared V2C MXene in argon or air was studied. From thermogravimetry and differential thermal analysis, V2C MXene was found to be stable in argon atmosphere at a temperature of up to 375 °C. As the temperature increased, V2C MXene was gradually oxidized to form nanoparticles composed of vanadium trioxide (V2O3) and a part of V2C MXene was broken and transformed to vanadium carbide (V8C7) at 1000 °C. In air atmosphere, V2C MXene was stable at 150 °C. At 1000 °C, V2C MXene was oxidized to form vanadium pentoxide (V2O5).

Highlights

  • In 2011, a novel two-dimensional (2D) transition metal carbide, Ti3 C2, was synthesized by removing the Al layer from titanium aluminum carbide (Ti3 AlC2 ) in hydrofluoric acid (HF) [1].The precursor, Ti3 AlC2, is a member of MAX phases, which is a family of ternary carbide or nitride with the formula Mn+1 AXn, where M is a transition metal, A is the main-group element, and X is either or both C and N

  • The thermal stability of the sample was analyzed by a thermal analyzer (STA449C, Netzsch, Selb, Germany) with α-Al2 O3 pans under argon/air flow with a heating rate of 5 ◦ C/min from room temperature (RT) to 1000 ◦ C

  • Most vanadium aluminum carbide (V2 AlC) had already been transformed to V2 C MXene

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Summary

Introduction

In 2011, a novel two-dimensional (2D) transition metal carbide, Ti3 C2 , was synthesized by removing the Al layer from titanium aluminum carbide (Ti3 AlC2 ) in hydrofluoric acid (HF) [1]. V2 C MXene theoretically has a much better performance than other MXenes, highly pure V2 C MXene is difficult to be made This is because the formation energy of V2 C MXene is lower than that of other MXenes [17]. In 2017, we found a new method, sodium fluoride/hydrochloric acid (NaF + HCl) etching at. This work was inspired by a report on synthesizing Ti3 C2 MXene by lithium fluoride/hydrochloric acid (LiF + HCl) etching [22]. There is no report on the thermal stability of V2 C MXene Another purpose of this paper is to study the thermal stability of V2 C MXene by thermal analysis

Syntheses of V2 C MXene
Characterization
Synthesis Process Analysis
Thermal Stability Analysis
Conclusions
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