Abstract
Au-Au thermocompression bonding is a widely used technique for a variety of applications including hermetic sealing and packaging at a fine pitch. We have investigated the roles of pressure and temperature individually at different pressures (15 -100 MPa) and temperatures (150 and 250° C) of sputter deposited 1.2 μm thick Au thin films using a flattening technique. The initial surface root mean square (RMS) roughness of deposited films was 3-5 nm. Void morphology and the evolution of the interface was studied using atomic force microscopy. Power spectral density function plots were used to study variation in asperities at the surface. The void morphology and evolution was different when flattening and bonding at different temperatures and pressures.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.