Abstract
Solvent cast thin films of blends polystyrene (PS) and poly (methylmethacrylate) (PMMA) with nominal compositions ranging from 25/75 wt.%/v% (w/v) up to 75/25 w/v PS/PMMA with toluene as the mutual solvent on crystalline Si (100) and silica substrates has been studied. Films of PS and PMMA blends have been examined by atomic force microscopy (AFM) and ellipsometry. The blend films with less than 50% PMMA bulk concentration generally exhibit pitted surfaces; the pit size varies with film thickness and bulk composition. When the PMMA bulk concentration is greater than 50%, the film surface can be described as island-like phase-separated structure. The surface segregation and morphology are explained in terms of solubility of the two polymers in the solvent and rewetting of PMMA relative to PS.
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