Abstract
The surfaces of nanostructured, porous SiO x /Si (air-oxidized Si) and SiO x thin films, deposited by excimer laser ablation in He and He + O 2 gas ambients, respectively, have been modified by the deposition of a monofunctional organosilane. They were characterized using photoacoustic Fourier-transform infrared (FTIR) X-ray photoelectron (XPS) spectroscopies, and field-emission scanning electron microscopy (FESEM). Photoacoustic FTIR analysis indicates that the organosilane has hydrolyzed to form a silanol, which has chemically reacted with SiO x through its surface silanol ( SiOH) group, to form siloxane (Si O Si) structures. An enhanced IR spectral signal is found, due to the expansion and contraction of both the pores of the solid and the gas within them.
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