The study of nanoscratch and nanomachining on hard multilayer thin films using atomic force microscope

Abstract

In this study, nanoscratching and nanomachining were conducted using an atomic force microscope (AFM) equipped with a doped diamond-coated probe (DDESP-10; VEECO) to evaluate the fabrication of nanopatterns on hard, Cr₂N/Cu multilayer thin films. The influence of normal force, scratch speed, and repeated scratches on the properties of hard multilayer thin films was also investigated. The nanoscratch experiments led researchers to establish a probe preparation and selection criteria (PPS criteria) to enhance the stability and accuracy of machining hard materials. Experimental results indicate that the depth of grooves produced by nanoscratching increased with an increase in normal force, while an increase in the number of scratches in a single location increased the groove depth but decreased friction. Therelationships among normal force and groove depth more closely resembled a logarithmic form than other mathematical models, as did the relationship between repeated scratching and its effect on groove depth and friction. The influence of scratch speed on friction was divided into two ranges. Between 0.1 and 2 µm/s, friction decreased logarithmically with an increase in scratch speed; however, when the speed exceeded 2 µm/s, the friction appeared stable. In this study, multilayered coatings were successfully machined, demonstrating considerable promise for the fabrication of nanopatterns in multilayered coatings at the nanoscale.