The structure, surface topography and mechanical properties of Si–C–N films fabricated by RF and DC magnetron sputtering

Abstract

Silicon carbon nitride thin films were deposited on Co-Cr alloy under varying deposition conditions such as sputtering power and the partial pressure ratio of N2 to Ar by radio frequency and direct current magnetron sputtering techniques. The chemical bonding configurations, surface topography and hardness were characterized by means of X-ray photoelectron spectroscopy, atomic force microscopy and nano-indentation technique. The sputtering power exhibited important influence on the film composition, chemical bonding configurations and surface topography, the electro-negativity had primary effects on chemical bonding configurations at low sputtering power. A progressive densification of the film microstructure occurring with the carbon fraction was increased. The films prepared by RF magnetron sputtering, the relative content of the Si–N bond in the films increased with the sputtering power increased, and Si–C and Si–Si were easily detachable, and C–O, N–N and N–O on the film volatile by ion bombardment which takes place very frequently during the film formation process. With the increase of sputtering power, the films became smoother and with finer particle growth. The hardness varied between 6GPa and 11.23GPa depending on the partial pressure ratio of N2 to Ar. The tribological characterization of Co–Cr alloy with Si–C–N coating sliding against UHMWPE counter-surface in fetal bovine serum, shows that the wear resistance of the Si–C–N coated Co–Cr alloy/UHMWPE sliding pair show much favourable improvement over that of uncoated Co–Cr alloy/UHMWPE sliding pair. This study is important for the development of advanced coatings with tailored mechanical and tribological properties.