Abstract
Abstract The structure of Ni-Fe films 200-250 A thick deposited on amorphous SiO2 surfaces has been examined by electron microscopy and X-ray diffraction techniques. These films are found to be significantly different from similar films deposited on crystalline substrates. Specifically, these films on amorphous surfaces are characterized by complete continuity at relatively lower thicknesses, and appear to have a low-dislocation post-continuity stage.
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