The Structural and Mechanical Properties of Ti Films Fabricated by Using RF Magnetron Sputtering

Abstract

Titanium films were deposited on various substrates, such as pure Si(100), oxide/Si(100), nitride/Si(100), TiOxNy/Si(100), PI(polyimide) and glass, by using r.f. magnetron sputtering. X-ray diffraction (XRD) data showed a distinct change in major film growth direction with the substrate. In the case of Ti film growth on pure Si(100), oxide/Si(100) and nitride/Si(100) surfaces, the film was strongly grown in the (100) direction while Ti films with growth preferentially in the (002) direction were observed on TiOxNy/Si(100), PI and glass surfaces. The surface morphologies were observed using atomic force microscopy (AFM). The mechanical properties were observed by using a nano-indenter.