Abstract
ABSTRACTWe examine the linear stability of a planar, alloy thin film, exposed to a deposition flux from the vapor. The film surface is subject to stresses generated by compositional inhomogeneity, as well as by film-substrate lattice mismatch. In addition to the misfit induced surface instability shown by numerous previous studies, we find that the deposition flux alone can produce instability and that complex interactions occur when both deposition and surface transport processes are present. Solute expansion stresses result in several novel behaviors. Under certain circumstances, the growing film can be completely stabilized by a tensile misfit and destabilized by the same magnitude of compressive misfit. The predictions of this theory are compared to the results of several experimental studies.
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