Abstract
A detailed study of the sputter yield of VSi 2 has been carried out by a computer simulation technique. Krypton and neon ions in the energy range of 200–5000 eV are used, and the angle of incidence on the (0001) surface of VSi 2 is taken to be 90°. The dynamical atom block considered in the computer program consists of 397 atoms situated at 5 equally spaced layers. Both amorphous and crystalline targets are discussed, having expectingly a different outcome for yield, as well as for preferential and directional sputtering. Theoretical results are in good accord with experimental findings.
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