Abstract
The specific adsorption of thallous ion on to platinum at controlled potential from very dilute solutions in 0·1 M HCl has been studied by means of a radioactive tracer technique. It is shown that adsorption of up to a monolayer of thallium takes place at potentials far removed from the potential for bulk deposition of thallium metal, and that two different adsorption mechanisms appear to be present. An explanation is advanced for the change in apparent saturation surface coverage with applied potential. The integral adsorption coefficient is presented as a function of potential and surface coverage.
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