Abstract
First-order erosion/deposition theory is applied to some examples of pattern delineation and planarization of microelectronic structures. An analogy between erosion/deposition phenomena and the progression of an optical wave front is developed, which explains many of the observable physical processes. Edges can form from an initially smooth profile and initial edges can expand into smooth curves; and it is demonstrated how they can be properly accounted for in a simulation code. Some examples of erosion and the codeposition phenomena are computed.
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