Abstract
The technology of silicon coatings deposition on various materials complex formed wares in RF discharge plasma is described briefly. The precursor’s choice and its polymerization mechanism on ware’s surfaces are explained. Perspective constructions of inner-chamber equipment and characteristic deposition regimes of breakdown-proof and corrosion-proof coatings deposition are presented. The advantages and shortcomings of the polymerization with auxiliary covered ware’s constant potential are noted.
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