Abstract
Angle-resolved x-ray photoelectron spectroscopy (AR-XPS) was used to analyze Si3N4/TiN(001) bilayers grown by ultrahigh vacuum reactive magnetron sputter deposition onto MgO(001), with a substrate potential of −150 V, in mixed 1:1 Ar/N2 discharges maintained at a total pressure of 0.5 Pa (3.75 × 10−3 Torr). The TiN(001) films were grown at 600 °C and the 4-ML-thick Si3N4 overlayers at room temperature. AR-XPS spectra were obtained using incident monochromatic Al Kα x-radiation at 0.83401 nm. Si3N4/TiN(001) Ti 2p spectra reveal enhanced unscreened final-state satellite peaks, compared to Ti 2p spectra obtained from uncapped TiN(001), due to decreased electronic screening induced by Si3N4/TiN(001) bilayer interfacial polarization.
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