Abstract
A concept is proposed for Electron-Beam Pattern Generators for increasing the theoretical writing speed at least one order of magnitude. The basic writing strategy is variable shaped single beam. A two dimensional array of high brightness electron sources is used. The individual emitters can be adressed seperately, the brightness can be modulated very quickly. The source is imaged at the mid-plane of the objective lens. The increase of total beam current which is necessary for the high writing speed is realized by (1) modulating the source brightness to keep the beam current constant while the shape surface varies, (2) optimizing the beamlet diameters and distances in the objective lens for minimal trajectory displacement effect and (3) correction of spherical aberration of the final lens either by the individual beamlet energy or using a gauze or foil correction element in the objective lens.
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