Abstract
The Shanghai deep ultraviolet free-electron laser source (SDUV-FEL) is an HGHG FEL facility designed for generating coherent output with wavelength down to 88 nm. The design and the relevant R&D of this HGHG FEL source have been under way since 2000. Currently, a 150 MeV S-band electron injector is under construction as the first linac section to produce a high brightness beam. The design study and the present R&D status of the SDUV-FEL have been presented in this paper.
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