The room temperature oxidation of titanium thin films

Abstract

Thin films of titanium were prepared under ultra high vacuum conditions so that the low temperature, low pressure oxidation kinetics of titanium could be characterized. The kinetics were followed gravimetrically and the oxide and metal films were examined using electron microscopy and X-ray diffraction. The nucleation of the oxide depended critically upon the titanium film preparations. Analysis of the earliest stages of oxidation indicate that this is limited by surface diffusion of oxygen. The later stages of oxidation are explained by consideration of the effects of metal vacancies generated at the oxide-metal interface.