Abstract

The adsorption, desorption, and decomposition of formic acid (HCOOH) on Cu(111), Cu(997), Zn-Cu(111), and Zn-Cu(997) were systematically studied by high-resolution x-ray photoelectron spectroscopy, temperature programmed desorption, and infrared reflection absorption spectroscopy. On the clean Cu(111) surface, 13% of formic acid molecules adsorbed at 83 K were dissociated to form bidentate formate species by heating at 300 K; however, on the Zn-Cu(111) surface, only 4% of adsorbed HCOOH molecules were dissociated into the bidentate formate species. On the contrary, 13% of adsorbed HCOOH molecules were already dissociated into monodentate formate species on Cu(997) even at 83 K and 17% of adsorbed formic acid molecules were transformed to bidentate formate species by heating at 300 K, indicating that the stepped Cu surface has higher reactivity for HCOOH dissociation at low temperature. On the Zn-Cu(997) surface, 20% of formic acid became bidentate formate species in contrast to the case with Zn-Cu(111). Thus, the Zn deposited Cu step surface shows special activity for adsorption and dissociation of formic acid. The desorption peak maxima of the formate decomposition products (CO2 and H2) on Zn-Cu(997) were shifted to higher temperatures than those on Cu(997). Zn on Cu surfaces plays an important role in the stabilization of formate species, which probably leads to the decrease in the activation barrier for hydrogenation on the Zn-Cu alloyed surface.

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