The role of water vapour on the oxidation of two Ln–Si–Al–O–N glasses (Ln=Y, La)

Abstract

The oxidation behaviour of LnSiAlON (Ln=Y, La) glasses was studied at different temperatures (990–1150 °C) and under different water vapour pressures (360–2690 Pa). These results were also compared with those obtained under O 2, N 2/H 2O or O 2/H 2O mixtures. When glasses are treated under a N 2/H 2O mixture, optical and SEM observations show porous scales. Transformations of the reaction rate data and a kinetic model show that there is only one limiting process occurring during oxidation. This rate limiting step is the progress of the chemical reaction at the internal interface. Determination of the pressure law dependence and thermodynamics calculations of water vapour molecules dissociation at the investigated temperatures allow us to suggest that the mechanism of oxidation corresponds to decomposition of water molecules on the oxynitride glass surface.