Abstract
Time-of-flight secondary ion mass spectrometry and high-resolution transmission electron microscopy study is reported on depth profiling of 375nm-thick multilayer La/B4C interferential mirrors produced by magnetron sputtering for X-ray radiation at the wavelength of 6.7nm. The introduction of ultra-thin (0.5nm) carbon barrier layer inside each period of ca. 7.5nm suppressed the broadening of interface regions, decreased the width of La and B profiles and as a result improved the reflectance of mirrors. Depending on the layers' sequence (La/C/B4C or La/B4C/C upward the Si substrate), two different mechanisms–chemical interaction and reaction diffusion, were employed for qualitative explanation of the obtained results.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
