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Abstract
In an ultrahigh vacuum chamber in which the partial pressure of Cl containing residual gases was 10 −12 Torr, the entire surface of a Cu sample was found to be covered with Cl after a small area (0.1 mm diameter) of the sample surface was irradiated with an electron beam. This was shown to be caused by secondary electrons rather than by surface migration as was postulated to explain a previously observed similar phenomenon.
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