The Role of Metal-Catalyzed Chemical Etching Black Silicon in the Reduction of Light- and Elevated Temperature-Induced Degradation in P-Type Multicrystalline Wafers

Abstract

Light- and elevated temperature-induced degradation (LeTID) of silicon wafers reduces the energy yield of photovoltaic modules in the field. A previous study demonstrated that this degradation is greatly reduced in samples with a surface textured with black silicon formed via reactive ion etching. However, the reason for this reduction is currently not understood. This article extends that result to a range of nano-textures formed using commercial metal-catalyzed chemical etching. Lifetime test structures are fabricated on multicrystalline wafers with six different chemical nano-textures and the results are compared to planar reference samples. The article demonstrates a reduction in the extent of light-induced degradation compared to planar reference samples for all six textures. The extent of LeTID is observed to reduce with decreasing front surface reflectance and increasing front surface area. The article finds that wafer thickness, phosphorus gettering, and fast-firing cannot explain the result.