Abstract
We have investigated various processes of DC magnetron sputtering films with on-axis geometry. The study shelved that the quality of YBCO thin films not only depended on the sputtering parameters such as gas pressure, DC voltage, and substrate temperature, but also depended on the structure of the magnetron sputtering gun. A variety of magnet configurations have been tested. We have identified several magnet arrangements with which high quality YBCO thin films could be obtained. With suitable magnet arrangements and optimal sputtering parameters, large area and high quality YBCO thin films could be fabricated with T/sub c/s about 90 K, J/sub c/s of 10/sup 6/ A/cm/sup 2/ at 77 K and zero field, and the transition width less than 1 K. >
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