Abstract
A collisional model that describes the response of a microwave multipolar bucket plasma to a high voltage pulse is developed for plasma source ion implantation (PSII). The primary purpose is to develop a theoretical model of PSII plasma physics to be used in conjunction with a model of ion-target interaction to optimize PSII processing. Measurements of the sheath position and target current in a 100 mtorr helium plasma are found to be consistent with the model. Sheath thicknesses predicted by the collisional model are significantly less than those predicted by similar noncollisional models.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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