Abstract
Both TbCo and TbFe thin films were dc-magnetron sputtered onto carbon-coated Cu grids as well as glass substrates from a three inch mosaic target using a variety of power levels and argon pressures (P Ar ). The perpendicular anisotropy (K u ) displays a maximum in the range of 2.5 to 11.5 mTorr of P Ar and decreased with further increases in P Ar . Films deposited at low P Ar ( Ar (> 11.5 mTorr) exhibit a rougher surface, a high density of microvoids and in-plane magnetic domains with ripple. A similar study was also made of the effects of deposition power on the microstructure and domains at P Ar = 5 mTorr. The K u was found to decrease with increasing power. The microstructure at 30,40 and 50 watts did not reveal any significant difference except that there was a slight increase in surface roughness with increasing power.
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