Abstract
The cesium beam of a General Ionex 834 sputter source is steered through an off-axis molybdenum cone, reflected by the negative ion extraction electrode and sharply focused on a pill of target material located on the back of the molybdenum cone. This improves the emittance of the negative ion beam and eliminates two disadvantages of this type of sputter source: (1) the complicated form of the target and (2) ionizer damage from backstreaming negative ions.
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