Abstract
The composition, electronic states and structure of thin Ni-P layers deposited by the electroless method were studied by soft X-ray emission spectroscopy, differential thermal analysis, secondary ion emission, X-ray diffraction and auxiliary microscopic investigations. The first centres of the layer consisted of pure crystalline nickel nuclei. With increasing growth, the deviation from crystallinity increased, with continous changes in the composition. Also, diffusion processes take place transporting aluminium and silicon from the underlying substrate.
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