Abstract
We successfully obtained the Mo2N nano-films after the high-temperature nitriding of the Mo films prepared by RF magnetron sputtering. Currently, this is the first report that Mo2N nano-films were obtained by direct nitriding with Mo films. The prepared Mo2N films were characterized by XRD, SEM and EDS. Besides the influence of different power and deposition time on the crystal structure of the Mo2N nano-films were analyzed. Compared with other preparation methods, this method formed a Mo2N nano-film with a strict stoichiometric ratio of Mo:N = 2:1, no non-stoichiometric or N-rich Mo2N films have been formed during the nitridation process. The Mo2N nano-films exhibited a superconducting effect at 3.8 K.
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