The porous silicon morphology effect on the growth of electrodeposited FeNi alloy

Abstract

In this work, we report on cathodic deposition of FeNi thin films into porous silicon (PS) formed on n-type Si. Macroporous and mesoporous silicon layers were formed at constant potential or current density. The electrodeposited thin films were characterized by Energy Dispersive Spectroscopy (EDS) and X-Ray Diffraction (XRD). The magnetic properties of the FeNi layers were investigated by hysteresis loops measurements. SEM images of the FeNi films indicate that tubular and granular forms were obtained depending on the porous silicon surface morphology. Moreover, the FeNi films compositions are found to depend on the porous silicon microstructure. Finally, the XRD spectra of the deposited films show the presence of FeNi (111) and FeNi (220) peaks. The FeNi (111) peak has been shown for all polarization potentials, in agreement with results reported in the literature.