Abstract
The low temperature chemical vapour deposition (CVD) of TiC, TiN and TiC x N 1− x in the presence of a d.c. plasma is described. The deposition rates were independent of the substrate temperature, but the substrate temperature had a marked effect on the coating properties. Coatings obtained at temperatures in excess of 400°C for TiN and 500°C for TiC began to show properties similar to those of coatings obtained by conventional CVD.
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