Abstract
A novel compact plasma sensor applicable for the supervision and control of industrial plasma processes is presented in this contribution. Based on the multipole resonance probe (MRP), the new planar MRP (pMRP) is introduced as a powerful and economical monitoring tool, flush-mounted into the reactor wall. Hence, it can be used for an effective suppression of disturbances of the plasma process itself. Using 3D electromagnetic field simulations with CST Microwave Studio, the pMRP is investigated and challenges as well as prospects of the new sensor design are discussed in detail. Three different sensor versions are presented and compared with the resonance behavior of the MRP. Furthermore, limitations concerning position tolerances are shown and the suitability of the pMRP is proven. Measurements in a double inductive coupled plasma, with argon as process gas and varying excitation powers, demonstrate the suitability of the pMRP for monitoring purposes.
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