The physics of amorphous-silicon thin-film transistors

Abstract

The basic physics underlying the operation and key performance issues of amorphous-silicon thin-film transistors (TFTs) are discussed. The static transistor characteristics are determined by the localized electronic states that occur in the bandgap of the amorphous silicon. The deep states, mostly consisting of Si dangling bonds, determine the threshold voltage, and the conduction band-tail states determine the field-effect mobility. The finite capture and emission times of the deep localized states lead to a dynamic transistor characteristic that can be described by a time-dependent threshold voltage. The transistors also show longer time threshold voltage shifts due to two other distinct mechanisms: charge trapping in the silicon nitride gate insulator and metastable dangling bond state creation in the amorphous silicon. These two mechanisms show characteristically different bias, temperature, and time dependencies of the threshold voltage shift. Illumination of a TFT causes the generation of electron-hole pairs in the space-charge region leading to a steady-state equal flux of electrons and holes and a reduction in the band-bending. In most applications, the photosensitivity should be minimized. The uniformity of large arrays of transistors for display applications is excellent, with variations in the threshold voltage of 0.5-1.0 V.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>