The photolysis of acetone at 308 nm

Abstract

The photolysis of acetone using an excimer laser (XeCl transition at 308 nm) was studied to determine its potential as a source of CH 3 radicals for kinetic measurements. The data were analysed by kinetic modelling and the potential of the system for kinetic measurements was examined by using it to study the reaction of CH 3 with propylene at temperatures in the range 298–431 K. The model can accurately describe the yields of CH 4, C 2H 6 and CO both in the presence and absence of propylene. The results obtained when mixtures of propylene and acetone were photolysed are consistent with current data on the reactions of propylene with CH 3 and suggest that the 308 nm photolysis of acetone is a viable source of CH 3 for kinetic measurements using end product analysis combined with kinetic modelling.