Abstract
Abstract Ferroelectric 0.4Pb(Yb 1/2 Nb 1/2 )O 3 –0.6PbTiO 3 (PYNT) thin film was prepared on Pt/Ti/SiO 2 /Si(100) substrates by multi-target rf magnetron sputtering deposition at substrate temperature of 550 o C. The YbNbO 4 oxide target was used as Yb and Nb sources. The effect of composition and substrate was investigated by X-ray diffraction analysis. Although the formation of perovskite phase mainly depends on the Pb sputtering power, the processing window is very narrow on Pt/Ti/SiO 2 /Si substrate. The substrates with the thick Pt electrodes tend to reduce the perovskite phase. Meanwhile, the TiO 2 buffer layer deposited on the Pt surface is observed to enhance the formation of the perovskite phase.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
