Abstract
The AT-1 system designed for deposition of hard coating, decorative or anticorrosive TiN layers with the biased activated reactive evaporation (BARE) method is described. The current-voltage characteristics of a plasma-activating electrode at various nitrogen pressures, electron beam currents (of the electron beam evaporator) as well as electrode geometries and positions are presented. The results of plasma measurements obtained by the glow discharge optical spectroscopy method are discussed.
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