Abstract
Ti-doped Al2O3 (Al2O3:Ti) films were prepared by the simultaneous RF magnetron sputtering of Al2O3 and DC magnetron sputtering of Ti. The structure of the Al2O3:Ti film corresponded to Al2O3. Reducing RF power caused the formation of thinner fibers of Al2O3:Ti in the film, favoring the hydrophilicity and increasing the optical energy gap of the deposited film. When a thicker Al2O3:Ti film was deposited at a higher RF power, it contained thicker fibers, and had a lower surface roughness, higher visible transmission and a higher linear refractive index. The Al/Ti atomic ratio significantly affected the hydrophilicity and optical properties of Al2O3:Ti films.
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