Abstract
The article was devoted to the research of nanocrystalline diamond (NCD) films deposition in a novel microwave plasma-assisted CVD reactor. In this work, the seeding of silicon substrate by the spin-coating method was optimized. Hydrosol suspensions of diamond nanopowder of two types, namely, with particles having the average size of 50nm (sizes ranging from 20 to 100 nm) and 5nm (mono-dispersed powder), were used. NCD films several hundred nanometers thick were grown on prepared substrates of one and three inches in diameter. The high-density plasma in the novel reactor was generated by the gyrotron radiation at the frequency of 30 GHz. Characteristics of grown diamond films were studied by SEM, AFM and Raman spectroscopy.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
