Abstract
The new nanosecond pulsed air plasma generators with nanosecond pulsed high voltage generators on the basis of new type of semiconductor switch Fast Ionization Device (FID) with high repetition are considered in the paper. This type of switches leads to design of compact high voltage nanosecond generators with short pulse rise on the level of few nanosecond and high repetition. The experimental results of generation for air nanosecond plasma with pulsed high voltage generators on the basis of combined capacitor-induction storage energy are given in this report. The two pulsed generators with pulse duration about 10 nsec and time rise of pulse about 1 nsec were used for generation of air plasma. The voltage was regulated from 5 to 60 kV. The repetition was changed from 0.01-10 kHz. The design of pulsed air plasma generators with applications is considered.
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