The Multipole Resonance Probe-based controller: a technology to investigate plasma-based deposition

Abstract

With the objective to improve plasma-based deposition processes new sensors for the investigation of the plasma-surface interaction have been developed over the last years. However, the direct access and the reproducible operation of specific plasma conditions are yet unconsidered but required to receive related measurement results. Hence, desired unstable operation points have to be stabilized by feedback controllers, which are also able to automatically compensate process drifts. Existing control systems for plasma-based deposition rely on secondary process variables, but these variables cannot be correlated with the plasma variables as a general rule and, therefore, a direct study of the plasma is limited. To lift this restriction a novel electron-plasma-frequency-based control instrument is proposed, which uses the Multipole Resonance Probe, a feedback controller and a signal-based estimator. The control system directly measures the electron plasma frequency, online estimates the process mode and calculates a related control input to achieve and hold a prescribed working point. Experiments are shown as a proof of concept for the motivation of a plasma-based control system, the identification of a control-oriented model and the applicability of the instrument in an argon-oxygen mixture.