Abstract
Films of GeO2 - 16% P2O5 - 8% V2O5 glass from 200 to 300 Å thick were produced by a technique utilizing radiofrequency (RF) sputtering. The GeO2 glass was RF sputtered onto highly polished substrates that were previously vacuum coated with a parting agent (fluorescein or phenolphthalein). Acetone was used to separate the water-soluble GeO2 glass film from the substrate. A transmission electron micrograph of a typical GeO2 glass film is shown in Fig. 1. The film exhibits an equiaxed structure with particles approximately 0. 1 μ in diameter. The crystal structure was amorphous as determined by selected area electron diffraction. Films such as this usually displayed good thickness uniformity and generally were very clean. However, films frequently broke up during separation in acetone. Film breakage was attributed to the combined effects of residual stresses and flaws which were found in most of the GeO2 glass films.
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