Abstract
The paper presents results of microstructural analysis of Hf-modified aluminide coatings. The coating was obtained using chemical vapour deposition (CVD) method at 1040°C using BPX-Pro 325 S equipment (Iond Bond). The deposition process time was 960 mintutes. The IN-718, IN-100 as well as CMSX-4 single-crystal nickel superalloys were the substrate material. The observation of coating was carried out using scanning electron microscopy. Chemical composition was analyzed using EDS method. The results showed that hafnium accumulates mainly on diffusion/additive layer interface and forms a „chain” of small precipitations. Hafnium was found in the additive NiAl layer of aluminide coating deposited on IN-100 superalloy. Its amount did not exceed 0.3 at %.
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