Abstract
The MEVVA (Metal Vapor Vacuum Arc) ion source is a new kind of source which can produce high current beams of metal ions. Beams of a wide range of elements have been produced, spanning the periodic table from lithium up to and including uranium. The source extraction voltage is up to 60 kV, and we are increasing this up to 120 kV. A total ion beam current of over 1 A has been extracted from the present embodiment of the concept, and this is not an inherent limit. The ion charge state distribution varies with cathode material and are current, and beams like Li +, Co +.2+.3+ and U 3+.4+.5+.6+ for example, are typical; thus the implantation energy can be up to several hundred kV without additional acceleration. The ion source has potential applications for ion implantation and ion beam mixing for achievement of improved corrosion resistance or wear resistance in metals or surface modification of ceramic materials and semiconductors. Here we outline the source and its performance, and describe some very preliminary implantation work using this source.
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