The mechanism of electroless Ni-P deposition studied by electrochemical mass spectrometry

Abstract

An acetate electroless nickel plating solution containing H 2PO 2 − as a reducing agent and D 2O as a solvent at pH 4.5 and t 0 = The isotopic composition of the evolved gas and rates of light and heavy hydrogen formation were determined to depend on electrode potential and on bot hypophosphite oxidation was found to increase in the cathodic region and to decrease in the anodic region in the presence of nickel(II). Nickel(II) was from water. The data obtained are discussed in terms of an electrochemical mechanism of electroless plating.