The main regularities of atomic fluorine interaction with gases in condensed state

Abstract

The interaction between intensive flows (10 16÷10 18s −1cm −1) of atomic fluorine with condesed: krypton (77 K), xenon (77÷115 K), xenon difluoride (100÷200 K), nitrogen dioxide (77÷150 K), nitrosyl fluoride (77÷150 K), chlorine (77÷140 K), chlorine trifluoride (77÷190 K) and chlorine(I) oxide were investigated. The fluorination of condensed samples were carried out in reaction volume, where zone of atomic fluorine generation was separated in space from the zone where the reaction took place. Atomic fluorine was formed by means of molecular fluorine dissociation on the heated surface of nickel catalyst and then transported to the surface of the sample to be fluorinated by diffusion. The loss of atomic fluorine during transportation was less then 10%. It was found out that for investigated reaction the following two parameters has the main influence on fluorination kinetics: the sample temperature and intensity of atomic fluorine flow. It was shown, that depending on these two parameters the interaction between atomic fluorine and the sample may be proceeded in one of the three following regimes: 1. the rate fluorination doesn't depend upon its starting thickness and degree of conversion; 2. the fluorinatin to the certain thickness, which decreases while intensity of F-atom flow increases; 3. the rate of fluorination depends upon the degree of conversion but doesn't depend upon the starting thickness. The optimum conditions of certain inorganic fluorides preparative synthesis using atomic fluorine were determined.